Extremely pure crystalSemiconductor behavior is sensitive to minute contamination. The source notes emphasize purity on the scale of roughly one unwanted atom per billion in early material processing.
Intentional dopingAdding selected donor atoms such as phosphorus, arsenic or antimony supplies mobile electrons and creates n-type silicon. Acceptor doping creates p-type material with holes as majority carriers.
Historical temperature advantageAli’s notes contrast roughly 200 °C silicon operation with germanium degradation above about 85 °C. Treat these as historical illustrative values: the safe maximum is always device-specific and comes from its datasheet.